PSH30AW is designed to fulfill the most stringent demands and utilizes widely across diverse laser processing applications, such as additive manufacturing(3D printing), high-precision cutting, high-precision welding, multi-head manufacturing, materials processing in the semiconductor industry, micro-structuring, drilling, processing-on-the-fly, scribing, etc.
The product is distinguished by its superior high precision, highest speed, minimal temperature drift and extraordinary long-term stability, while maintaining maximum flexibility in terms of usage.
| Maximum allowed average laser power(1) | 1000 W |
| Cooling | water |
| Aperture | 30 mm |
| Typical scan angle(2) | ± 10° |
| Tracking error | 0.5 ms |
| Step response(1% of full scale) | 1.1 ms |
| Speed | |
Positioning / Jump(3) | 8 m/s |
| Line scan(3) | 8 m/s |
| Vector scan(4) | 1.2 m/s |
| Good writing quality(3)(5) | 280 cps |
| Precision | |
| Linearity | 99.90 % |
| Repeatability | 2 μrad |
| Temperature drift | |
| Offset(μrad/℃) | 15 |
| Gain(μrad/℃) | 15 |
| Long-term drift(at contant ambient temperature around 25℃) | |
| Offset(μrad) | 25 |
| Gain(μrad) | 40 |
| Operating temperature range | 25 ℃ ± 10 ℃ |
| Signal interface | Analog:± 10 V or ± 5 V |
Digital:XY2-100, PRS422 | |
| Input power requirement(DC) | ± 15 V @ 5 A Max RMS |
| Net weight | |
| Volume |
Note:
(1) For laser wavelength 1030-1090 nm.
(2) All angles are in mechanical degrees.
(3) With F-Theta objective f = 163 mm. Speed value varies correspondingly with different focal lengths.
(4) Reapeatibility and temperature drift are measured within this speed.
(5) Single-stroke font with 1 mm height.
(6) Long-term temperature drift is given under an ambient temperature environment of 25°C. and a working load under 500W. Temperature drift testing with high laser power is strictly prohibited. High laser power could induce thermal deformations in both the optical and mechanical systems, making it impossible to differentiate whether the drift is originating from galvanometer scanner itself or due to deformations in the optical and mechanical systems.