The PSH30MW scan heads are highly versatile and well-suited for a wide range of laser processing applications, such as laser marking, laser cleaning, drilling, welding, scribing, micro-structuring, materials processing, processing on-the-fly, etc.
The PSH30MW scan heads are specifically designed to perform optimally in high-laser-power scenarios below the 3-kilowatt range. All products are equipped with a water cooling system to effectively minimize temperature drift. These products exhibit exceptional long-term stability, high dynamic performance, and superior safety features.
| Maximum allowed average laser power(1) | 3000 W |
| Cooling | Water |
| Aperture | 30 mm |
| Typical scan angle(2) | ± 10° |
| Tracking error | 0.45 ms |
| Step response(1% of full scale) | 1 ms |
| Speed | |
Positioning / Jump(3) | 8 m/s |
| Line scan(3) | 8 m/s |
| Vector scan(4) | 1.2 m/s |
| Good writing quality(3)(5) | 280 cps |
| Precision | |
| Linearity | 99.90 % |
| Repeatability | 2 μrad |
| Temperature drift | |
| Offset(μrad/℃) | 20 |
| Gain(μrad/℃) | 20 |
| Long-term drift(after 30 mins warm up)(6) | |
| Offset(μrad) | 40 |
| Gain(μrad) | 80 |
| Operating temperature range | 25 ℃ ± 10 ℃ |
| Signal interface | Analog:± 10 V or ± 5 V |
Digital:XY2-100, PRS422 | |
| Input power requirement(DC) | ± 15 V @ 5 A Max RMS |
| Net weight | |
| Volume |
Note:
(1) For laser wavelength 1030-1090 nm.
(2) All angles are in mechanical degrees.
(3) With F-Theta objective f = 163 mm. Speed value varies correspondingly with different focal lengths.
(4) Reapeatibility and temperature drift are measured within this speed.
(5) Single-stroke font with 1 mm height.
(6) Long-term temperature drift is given under an ambient temperature environment of 25°C. and a working load under 500W. Temperature drift testing with high laser power is strictly prohibited. High laser power could induce thermal deformations in both the optical and mechanical systems, making it impossible to differentiate whether the drift is originating from galvanometer scanner itself or due to deformations in the optical and mechanical systems.